Proceedings of the July 1995 conference. One hundred papers describe important work in X-ray diffraction (XRD), reflectivity, and fluorescence. Topics include the evolution of X-ray instrumentation, techniques, and software; conditioning of X-ray beams and other developments in X-ray instrumentation; stress and strain determination by diffraction methods, peak broadening analysis; characterization of polymers, anorphous materials and organics by X-ray neutron scattering; precision, accuracy in XRD, phase analysis; characterization of thin films by X-ray diffraction and fluorescence; other applications of X-ray diffractions including high-temperature and non-ambient; total reflection XRF and trace analysis; and quantitative XRF data interpretation and other XRF applications. Annotation c. by Book News, Inc., Portland, Or. | Advances in X-Ray Analysis by John V. Gilfrich, Hardcover | Indigo Chapters